دانلود کتاب Fundamentals of Electrochemical Deposition, Second Edition

Excellent teaching and resource material . . . it is concise, coherently structured, and easy to read . . . highly recommended for students, engineers, and researchers in all related fields." -Corrosion on the First Edition of Fundamentals of Electrochemical Deposition From computer hardware to automobiles, medical diagnostics to aerospace, electrochemical deposition plays a crucial role in an array of key industries. Fundamentals of Electrochemical Deposition, Second Edition is a comprehensive introduction to one of today's most exciting and rapidly evolving fields of practical knowledge. The most authoritative introduction to the field so far, the book presents detailed coverage of the full range of electrochemical deposition processes and technologies, including: * Metal-solution interphase * Charge transfer across an interphase * Formation of an equilibrium electrode potential * Nucleation and growth of thin films * Kinetics and mechanisms of electrodeposition * Electroless deposition * In situ characterization of deposition processes * Structure and properties of deposits * Multilayered and composite thin films * Interdiffusion in thin film * Applications in the semiconductor industry and the field of medicine This new edition updates the prior edition to address the new developments in the science and its applications, with new chapters on innovative applications of electrochemical deposition in semiconductor technology, magnetism and microelectronics, and medical instrumentation. Added coverage includes such topics as binding energy, nanoclusters, atomic force, and scanning tunneling microscopy.Example problems at the end of chapters and other features clarify and improve understanding of the material. Written by an author team with extensive experience in both industry and academe, this reference and text provides a well-rounded introduction to the field for students, as well as a means for professional chemists, engineers, and technicians to expand and sharpen their skills in using the technology.Content: Chapter 1 Overview (pages 1–6): Chapter 2 Water and Ionic Solutions (pages 7–23): Chapter 3 Metals and Metal Surfaces (pages 25–40): Chapter 4 Metal–Solution Interphase (pages 41–54): Chapter 5 Equilibrium Electrode Potential (pages 55–76): Chapter 6 Kinetics and Mechanism of Electrodeposition (pages 77–112): Chapter 7 Nucleation and Growth Models (pages 113–138): Chapter 8 Electroless Deposition (pages 139–168): Chapter 9 Displacement Deposition (pages 169–175): Chapter 10 Effect of Additives (pages 177–198): Chapter 11 Electrodeposition of Alloys (pages 199–208): Chapter 12 Metal Deposit and Current Distribution (pages 209–219): Chapter 13 Characterization of Metallic Surfaces and Thin Films (pages 221–235): Chapter 14 In Situ Characterization of Deposition (pages 237–248): Chapter 15 Mathematical Modeling in Electrochemistry (pages 249–271): Chapter 16 Structure and Properties of Deposits (pages 273–288): Chapter 17 Electrodeposited Multilayers (pages 289–306): Chapter 18 Interdiffusion in Thin Films (pages 307–319): Chapter 19 Applications in Semiconductor Technology (pages 321–331): Chapter 20 Applications in the Fields of Magnetism and Microelectronics (pages 333–343): Chapter 21 Frontiers in Applications: The Field of Medicine (pages 345–353):